Votyakov, Sergey A., Igor A. Kudryashov, Christian Budich, Alexey N. Kirichenko, Alexey S. Useinov, and Gulnaz Kh. Sultanova. “IN SITU STRESS MAPPING DURING SILICON INDENTATION USING RAMAN SPECTROSCOPY”. ChemChemTech 67, no. 10 (October 12, 2024): 22-28. Accessed June 4, 2025. https://ctj-isuct.ru/article/view/6116.