ON MECHANISMS OF INCREASING HCL DISSOCIATION DEGREE IN GLOW DISCHARGE PLASMA

  • Alexander M. Efremov Ivanovo State University of Chemistry and Technology
  • Dmitry B. Murin Ivanovo State University of Chemistry and Technology
  • Sergey V. Belyaev Ivanovo Fire and Rescue Academy of the State Fire Service of the Ministry of the RF for Civil Defense
Keywords: plasma, hydrogen chloride, kinetics, dissociation degree

Abstract

The influence of initial compositions of the binary HCl+Ar and HCl+O2 gas mixtures on the hydrogen chloride dissociation kinetics in low temperature gas discharge plasma was investigated. The experiments were carried out under the conditions of direct current glow discharge at constant total gas pressure (100 Pa) and discharge current (25 mA). The data on electro-physical plasma parameters and plasma composition were obtained by modeling procedure based on the simultaneous solution of Boltzmann kinetic equation and the equations of chemical kinetics for neutral and charged species in a steady-state approximation. It was found that an increase in the second component fraction in both gas mixtures results in the sufficient increase in the HCl dissociation degree (aHCl = 23–43% for 0–80% Ar and 23–90% for 0–80% O2), which is associated with different mechanisms. Particularly, in the HCl+Ar gas mixture, an effect of increasing aHCl is provided by an increase in the electron impact dissociation frequency due to the change in electro-physical plasma parameters, such as electron mean energy and electron density. For the HCl+O2 gas mixture, such mechanism is almost negligible because of the weak disturbances in both electron energy distribution and formation/decay balance for charged species in the combination of two molecular electronegative gases. At the same time, the HCl dissociation kinetics in this gas system appears to be strongly dependent on the gas-phase interactions with ground state of oxygen atoms O(3P), metastable atoms O(1D) and OH radicals. It was found that the rates of corresponding processes begin to exceed the HCl electron impact dissociation rate at 20% O2 in HCl+O2.

Forcitation:

Efremov A.M., Murin D.B., Belyaev S.V. On mechanisms of increasing hcl dissociation degree in glow discharge plasma. Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol. 2018. V. 61. N 7. P. 61-66

References

Ecology. Edt. by L.I. Tsvetkova. SPb.: Novyi Zhurnal. 2012. 451 p. (in Russian).

Lebedev N.N. Chemistry and technology of basic organic and petrochemical synthesis. M.: Al’yans. 2013. 592 p. (in Russian).

Industrial Chlorine-organic products. Ed. by L.A. Oshin. M.: Khimiya. 1978. 656 p. (in Russian).

Levinsky M.I., Mazanko A.F., Novikov I.N. Hydrogen chloride and hydrogen chloric acid. M.: Khimiya. 1985. 160 p. (in Rus-sian).

Yakimenko L.M. Electro-chemical processes in chemical industry: The production of hydrogen, oxygen, chlorine and alkalis. M.: Khimiya. 1981. 323 p. (in Russian).

Low temperature plasma. Vol. 4. Plasma chemical technology. Ed. by V.D. Parkhomenko, Yu.D. Tret’yakov. Novosibirsk: Nau-ka. Sib. otd. 1991. 392 p. (in Russian).

Bugaenko L.T., Kuz’min M.G., Polak L.S. High energy chemistry. M.: Khimiya. 1988. 368 p. (in Russian).

Efremov A.M., Belyaev S.V., Titova E.S. Plasma chemical conversion of dangerous gases. Art. of X internat. sci.-pract. conf. “Fire and emergency safety”. November 26-27, 2015. Ivanovo: Ivanovskaya pozharno-spasatelnaya akademiya GPS MChS Ros-sii. P. 420-426 (in Russian).

Efremov A.M., Titova E.S. Opportunities of plasma-chemical utilization of hydrogen chloride. Art. of IX internat. sci.-pract. conf. “Fire and emergency safety”. November 20-21, 2014. Ivanovo: Ivanovskaya pozharno-spasatelnaya akademiya GPS MChS Rossii. P. 217-221 (in Russian).

Efremov A.M. Yudina A.V., Davlyatshina A.A., Murin D.B., Svettsov V.I. The effects of additive gases (Ar, N2, H2, Cl2, O2) on HCl plasma parameters and composition. Proc. of SPIE. 2012. V. 8700, 870003 (1-10).

Efremov A.M. Yudina A.V., Svettsov V.I. Electro-physical plasma parameters under the conditions of direct current glow dis-charge in HCl/Ar gas mixture. Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol. 2011. V. 54. N 3. P. 15-18 (in Russian).

Efremov A.M., Davlyatshina A.A., Svettsov V.I. Electro-physical plasma parameters under the conditions of direct current glow discharge in HCl-O2 gas mixtures. Izv. Vyssh. Uchebn. Zaved. Khim. Khim. Tekhnol. 2012. V. 55. N 4. P. 71-75 (in Russian).

Karyakin Yu.V., Angelov I.I. Pure chemical substances. M.: Kniga po trebovaniyu. 2013. 408 p. (in Russian).

Rokhlin G.N. Gas discharge light sources. M.: Energoatomizdat. 1991. 720 p. (in Russian).

Lide D.R. Handbook of chemistry and physics. N.-Y.: CNR Press. 2010. 2496 p.

Lieberman M.A., Lichtenberg A. J. Principles of plasma discharges and materials processing. N.-Y.: John Wiley & Sons Inc. 2005. 757 p.

Hsu C.-C., Nierode M.A., Coburn J.W., Graves D.B. Comparison of model and experiment for Ar, Ar/O2 and Ar/O2/Cl2 in-ductively coupled plasmas. J. Phys. D: Appl. Phys. 2006. V. 39. P. 3272-3291.

Kwon K.-H., Efremov A., Kim M., Min N.K., Jeong J., Kim K. Model-Based Analysis of Plasma Parameters and Active Spe-cies Kinetics in Cl2/X (X=Ar, He, N2) Inductively Coupled Plasmas. J. Electrochem. Soc. 2008. V. 155. P. D777-D782.

Kwon K.-H., Efremov A., Kim M., Min N.K., Jeong J., Kim K. A model-based analysis of plasma parameters and composition in HBr/X (X=Ar, He, N2) inductively coupled plasmas. J. Electrochem. Soc. 2010. V. 157. P. H574-H579.

Efremov A.M., Titova E.S. On the possibility of plasma chemical conversion of hydrogen chloride. Russ. J. Gen. Chem. 2016. V. 86. N 2. P. 478–483.

How to Cite
Efremov, A. M., Murin, D. B., & Belyaev, S. V. (1). ON MECHANISMS OF INCREASING HCL DISSOCIATION DEGREE IN GLOW DISCHARGE PLASMA. ChemChemTech, 61(7), 62-67. https://doi.org/10.6060/ivkkt.20186107.5697
Section
CHEMICAL TECHNOLOGY (inorganic and organic substances. Theoretical fundamentals)